Journal abbreviation: Chemical vapor deposition
The abbreviation of the journal title "Chemical vapor deposition" is "Chem. Vap. Depos.". It is the recommended abbreviation to be used for abstracting, indexing and referencing purposes and meets all criteria of the ISO 4 standard for abbreviating names of scientific journals.
The table below outlines in detail the ISO 4 rules and matches to the ISSN maintained list of title word abbreviations (TWA) to derive the abbreviation.
|Chemical||Chem.||matches the stem "chemic-"|
|vapor||Vap.||matches the stem "vapor-"|
|deposition||Depos.||matches the word "Deposition"|
ISO 4 abbreviation is a uniform system created by the International Organization for Standardization to abbreviate journal titles in a consistent manner. It serves to facilitate effective communication and reference within the academic community.
Journal title abbreviations come in three primary forms: ISO (International Organization for Standardization) for general disciplines, NLM (National Library of Medicine) for biomedical and life sciences, and CASSI (CAS Source Index) for chemistry and associated fields.
About the journal
|Full journal title||Chemical vapor deposition|
|Abbreviation||Chem. Vap. Depos.|